Welcome letter
Publisher: American Vacuum Society (AVS)
Authors:Paul M. Feeney; Robert L. Rhoades
Year: 2015
Document Type:
The dynamics of the CMP discovery for device applications in IBM
Publisher: American Vacuum Society (AVS)
Authors:Klaus D Beyer
Year: 2015
Document Type:
Updates on Ge and SiGe CMP processes for integration as high mobility channel materials
Publisher: American Vacuum Society (AVS)
Authors:Patrick Ong; Lieve Teugels; Martine Delande; Sheikh Ansar; Rithu Bhonsle; Max Siebert; Leonardus Leunissen
Year: 2015
Document Type:
Attributes of an advanced node cu-barrier slurry
Publisher: American Vacuum Society (AVS)
Authors:James Schlueter; Maitland Graham; Tim Clore; Mark O'Neill; Brian Cheng Chuan Lee; Chia Chien Lee
Year: 2015
Document Type:
Three dimensional pH - potential diagram of cobalt slurry with corrosion rate
Publisher: American Vacuum Society (AVS)
Authors:Yasuhiro Ichige; Mayumi Ouchi; Koji Mishima; Koji Haga; Seiichi Kondo
Year: 2015
Document Type:
CMP development of gallium nitride material
Publisher: American Vacuum Society (AVS)
Authors:Chunrong Jia; Baoguo Zhang
Year: 2015
Document Type:
Effect of photocatalytic oxidation technology on GaN CMP
Publisher: American Vacuum Society (AVS)
Authors:Jie Wang; Tongqing Wang; Jie Cheng; Hongkai Li; Can Rao; Xinchun Lu
Year: 2015
Document Type:
Proposal of cleanliness evaluation method of CMP pad, and investigation of cleaning effect by the high-pressure jet
Publisher: American Vacuum Society (AVS)
Authors:Masashi Kitamura; Syuhei Kurokawa; Yuta Tokumoto; Terutake Hayashi; Hirokuni Hiyama; Yutaka Wada; Chikako Takatoh
Year: 2015
Document Type:
Post cleaning and defect reduction for tungsten chemical mechanical planarization
Publisher: American Vacuum Society (AVS)
Authors:Wei-Tsu Tseng; James Hagan; Kaushik Mohan; Ricky Hull; James MacDougall; Richard Murphy; Steven Molis; Leo Tai
Year: 2015
Document Type:
FEOL CMP modeling: Progress and challenges
Publisher: American Vacuum Society (AVS)
Authors:Ruben Ghulghazaryan; Jeff Wilson; Ahmed Abouzeid
Year: 2015
Document Type:
Reduced defectivity and cost of ownership copper CMP cleans using low pH, BTA free, noble-bond chemistry
Publisher: American Vacuum Society (AVS)
Authors:Christopher Eric Brannon
Year: 2015
Document Type:
A new contact model of pad surface asperities utilizing measured geometrical features
Publisher: American Vacuum Society (AVS)
Authors:Yohei Hashimoto; Shingo Oshika; Norikazu Suzuki; Eiji Shamoto
Year: 2015
Document Type:
Reactive molecular dynamics simulation of Si chemical mechanical polishing process
Publisher: American Vacuum Society (AVS)
Authors:Jialin Wen; Xinchun Lu
Year: 2015
Document Type:
Planarization with suspended polyurethane beads and a stiff counterface: Pad-in-a-bottle experiments and simulation
Publisher: American Vacuum Society (AVS)
Authors:Duane Boning; Wei Fan; Yun Zhuang; Yasa Sampurno; Ara Philipossian
Year: 2015
Document Type:
Single-molecule spectroscopic analysis of adsorption phenomena on colloidal silica abrasives used in chemical-mechanical planarization slurries
Publisher: American Vacuum Society (AVS)
Authors:Lauren M. Jacobson; Donald K. Schorr; Edward E. Remsen; Colin T. Carver; Ashwani K. Rawat; Mansour Moinpour
Year: 2015
Document Type:
Efficient development of post-CMP cleans for ceria slurries
Publisher: American Vacuum Society (AVS)
Authors:Peter Wrschka; Steve Medd; Robert Green; Paul Feeney
Year: 2015
Document Type:
Effect of pad surface temperature and dry/ wet conditions on pad surface properties
Publisher: American Vacuum Society (AVS)
Authors:Yuichi Tomiie; Michio Uneda; Kazutoshi Hotta; Kazusei Tamai; Hitoshi Morinaga; Ken-ichi Ishikawa
Year: 2015
Document Type:
Advanced Cu barrier CMP slurries: ACuPLANEGäó 7000 platform
Publisher: American Vacuum Society (AVS)
Authors:Shawn Ware; Matt VanHanehem; Kevin Jacobs; Todd Buley; Jamie Cohen
Year: 2015
Document Type:
Mechanism of chemical mechanical polishing of Ti0.4Sb2Te3 film using KMnO4 as oxidizer in an acidic slurry
Publisher: American Vacuum Society (AVS)
Authors:Shasha Li; Weili Liu; Zhitang Song
Year: 2015
Document Type:
A novel platform for next generation pad conditioning
Publisher: American Vacuum Society (AVS)
Authors:Elbert Chou; A. Scott Lawing
Year: 2015
Document Type:
Brownian diffusion analysis for nano-abrasives in CMP slurry by using fluorescence polarization method
Publisher: American Vacuum Society (AVS)
Authors:Terutake Hayashi; Seri Toshiki; Syuhei Kurokawa
Year: 2015
Document Type:
Non-uniformity and removal rate selectivity investigations in through silicon via front side CMP
Publisher: American Vacuum Society (AVS)
Authors:Can Rao; Tongqing Wang; Jie Cheng; Hongkai Li; Haoming Sun; Xinchun Lu
Year: 2015
Document Type:
Study on effect of back-surface treatment of silicon wafer in photo lithography process after CMP process
Publisher: American Vacuum Society (AVS)
Authors:Ki Min; Sungmin Kang; Taesung Kim
Year: 2015
Document Type:
Planarization improvement using non-porous polishing pad in ILD CMP
Publisher: American Vacuum Society (AVS)
Authors:Che-Chin Yang; Kai En Lin; Wei-Nan Fang; Jian-Shiun Chen; Yi-Ching Wu; Yung-Chieh Kuo; Hung-Bo Lu
Year: 2015
Document Type:
The electrochemical behaviour during chemical mechanical polishing of Ti in peroxide based alkaline slurries
Publisher: American Vacuum Society (AVS)
Authors:Chenliang Liang; Weili Liu; Zhitang song
Year: 2015
Document Type:
The elastic impact of polishing pad for sapphire polishing
Publisher: American Vacuum Society (AVS)
Authors:Katsumasa Kawabata; Keiichiro Fujimoto; Kazutaka Miyamoto
Year: 2015
Document Type:
Particle size distribution shift as a predictor of slurry stability
Publisher: American Vacuum Society (AVS)
Authors:Jimmy Granstrom; Shogo Oonishi; Masaki Tada; Hisashi Takeda
Year: 2015
Document Type:
Application of a novel conditioning platform to a tungsten polishing process
Publisher: American Vacuum Society (AVS)
Authors:William Bellamak; A. Scott Lawing
Year: 2015
Document Type:
Research on the manufacturing of high purity colloidal silica abrasive with controlled particle size
Publisher: American Vacuum Society (AVS)
Authors:Fei Qin; Weili Liu
Year: 2015
Document Type:
Optimization of CO2 bubbling (carbonation) for post CMP cleaning process
Publisher: American Vacuum Society (AVS)
Authors:Minho Hong; Taesung Kim
Year: 2015
Document Type:
Evaluation of various composition Cu-resin plates in sapphire DMP (Diamond Mechanical Polishing) process
Publisher: American Vacuum Society (AVS)
Authors:Dong-Ha Kim; Byoung-Jun Cho; Jung-Hwan Lee; Jin-Goo Park
Year: 2015
Document Type:
Next generation composite, rigid filter for Chemical Mechanical Planarization
Publisher: American Vacuum Society (AVS)
Authors:John Morby; Majid Entezarian; Bob Gieger
Year: 2015
Document Type:
The era of IoT advancing CMP consumables growth
Publisher: American Vacuum Society (AVS)
Authors:Sue Davis; Karey Holland; Jerry Yang; Michael A. Fury; Lita Shon-Roy
Year: 2015
Document Type:
Active dummy generation for homogeneity increase in a 130 nm SiGe-BiCMOS process
Publisher: American Vacuum Society (AVS)
Authors:Marco Lisker; Andreas Kruger; Egbert Matthus; Andreas Trusch; A. Mai
Year: 2015
Document Type:
Optimized slurry compositions for the polishing of sapphire surfaces
Publisher: American Vacuum Society (AVS)
Authors:William R. Gemmill; Chelsea D. Cates
Year: 2015
Document Type:
Chemical mechanical planarization studies on gallium nitride for improved performance
Publisher: American Vacuum Society (AVS)
Authors:Ayse Karagoz; G. Bahar Basim; Max Siebert; Leonardus A. H. Leunissen
Year: 2015
Document Type:
Formation of dot patterns with particles using inkjet method to examine and inspect performance of CMP cleaning process
Publisher: American Vacuum Society (AVS)
Authors:Shohei Shima; Satomi Hamada; Yutaka Wada; Chikako Takatoh; Akira Fukunaga
Year: 2015
Document Type:
Challenges of TSV backside process integration
Publisher: American Vacuum Society (AVS)
Authors:Catharina Rudolph; Holger Wachsmuth; Mathias Boettcher; Wolfram Steller; M. Juergen Wolf
Year: 2015
Document Type:
Simplification of Replacement Metal Gate CMP metrology for FinFET
Publisher: American Vacuum Society (AVS)
Authors:Michael D. Wedlake; Adrian Santos Lopez; Steven Trigno; Patrick Aniekwu
Year: 2015
Document Type:
Chemical mechanical polishing implementation on dental implants
Publisher: American Vacuum Society (AVS)
Authors:G. Bahar Basim; Zeynep Ozdemir
Year: 2015
Document Type:
Planarization limbo with silicon wafers
Publisher: American Vacuum Society (AVS)
Authors:Dan Trojan; Marie Mitchel; Christopher Shumway; Paul Feeney
Year: 2015
Document Type:
Qualification of a ceria slurry reclaim system for shallow trench isolation polish in high volume manufacturing
Publisher: American Vacuum Society (AVS)
Authors:Tito Tang; Pete Beckage; Greg Westhauser; Clayton Judd; Allen Evans; Larry Kuehn; Bret Rhea; Alejandro Guerra; Greg Goodwin; Brad Yellitz; Franz Brummer; Andreas Wunderlich; Scott Ray
Year: 2015
Document Type:
Study on evaluation method for surface topography of polishing pad based on optical Fourier transform
Publisher: American Vacuum Society (AVS)
Authors:Keisuke Suzuki; Takahiro Tajiri; Panart Khajornrungruang; Yoshihiro Mochizuki; Hirokuni Hiyama; Hisanori Matsuo
Year: 2015
Document Type:
Ellipsometric measurement of particle-spiked wafer surfaces
Publisher: American Vacuum Society (AVS)
Authors:Eiichi Kondoh; Hayato Kotagiri; Mitsuhiro Watanabe; Satomi Hamada; Shohei Shima; Hirokuni Hiyama
Year: 2015
Document Type:
In-line refractive index monitoring for CMP slurry fault detection
Publisher: American Vacuum Society (AVS)
Authors:Carlo Dominic Aparece; Robert Johnston; Marcus Kavaljer
Year: 2015
Document Type:
Investigation of CMP on GaN substrate for led manufacturing
Publisher: American Vacuum Society (AVS)
Authors:Hua Gong; Guoshun Pan; Chunli Zou; Dan Guo; Yuhong Liu
Year: 2015
Document Type:
A study of surface defects of GaN during CMP process
Publisher: American Vacuum Society (AVS)
Authors:Zou Chunli; Pan Guoshun; Gong Hua; Xu Li; Zhou Yan; Liu Yuhong
Year: 2015
Document Type:
Light scattering analysis for undiluted slurry management
Publisher: American Vacuum Society (AVS)
Authors:Michael A. Fury; Kelly A. Barry
Year: 2015
Document Type:
Normal force and behavior of containing water during the compression of PVA brush
Publisher: American Vacuum Society (AVS)
Authors:Kenya Nishio; Toshiyuki Sanada; Akira Fukunaga; Hirokuni Hiyama
Year: 2015
Document Type:
Friction monitoring of conventional diamond conditioner and its application
Publisher: American Vacuum Society (AVS)
Authors:Hojoong Kim; Donghyun Lim; Byungil Lee; Hasub Hwang; Sunjae Jang; Taesung Kim
Year: 2015
Document Type:
Effects of silica abrasive size on sapphire CMP performances and their removal mechanisms
Publisher: American Vacuum Society (AVS)
Authors:Yan Zhou; Guoshim Pan; Xiaolei Shi; Hua Gong; Chunli Zou; Li Xu
Year: 2015
Document Type:
Investigation on cu height process control method in BEOL Cu CMP
Publisher: American Vacuum Society (AVS)
Authors:Ji Chul Yang; Daniel Scheffler; Gerett Yocum; Jason Mazzotti; Mark Dougherty
Year: 2015
Document Type:
Challenges in Post CMP in-situ cleaning for sub-14nm device yield enhancement
Publisher: American Vacuum Society (AVS)
Authors:Hong Jin Kim; Tae Hoon Lee; Liqiao Qin; Sumeet Kashyap
Year: 2015
Document Type:
High-rate CMP process for large PCB by controlling platen coolant temperature
Publisher: American Vacuum Society (AVS)
Authors:Minjong Yuh; Haedo Jeong; Hyoungjae Kim
Year: 2015
Document Type:
Study of inhibition mechanism of glycine on the electrochemical behavior of Mo in the alkaline slurry
Publisher: American Vacuum Society (AVS)
Authors:Guang Yang; Hui Feng; Xu Wang; Xin-Ping Qu
Year: 2015
Document Type:
Advanced CMP conditioning for front end applications
Publisher: American Vacuum Society (AVS)
Authors:John Zabasajja; Terry Pfau; Rob Rhoades; Jennifer Sokol; Matt Fritz; Vince Laraia; Noah Shanti
Year: 2015
Document Type:
Accelerated corrosion and oxidation of tungsten plug during tungsten CMP
Publisher: American Vacuum Society (AVS)
Authors:Kyungho Hwang; Keejoon Oh; Hyunghwan Kim; Nohjung Kwak
Year: 2015
Document Type:
Yield improvement through improved uniformity via application of multi-zone polish head for STI-CMP
Publisher: American Vacuum Society (AVS)
Authors:Benno Milmore; Scott Wills; Yanmei Xing; Mike Liu
Year: 2015
Document Type:
Repulsive effect between abrasives during CMP process
Publisher: American Vacuum Society (AVS)
Authors:Yen Tao Tseng; Peng Hsin Wang; Ming Che Ho; Song Yuan Chang; Ming Hui Lu
Year: 2015
Document Type:
Influence into platen and polishing pad surface temperature on removal rate in sapphire-chemical mechanical polishing
Publisher: American Vacuum Society (AVS)
Authors:Takahiro Matsunaga; Michio Uneda; Yoshihiro Takahashi; Kazutaka Shibuya; Yoshio Nakamura; Daizo Ichikawa; Ken-ichi Ishikawa
Year: 2015
Document Type:
CMP solutions for 3D-NAND staircase CMP
Publisher: American Vacuum Society (AVS)
Authors:Tina C. Li; Brian Reiss; Sudeep Pallikkara Kuttiatoor; Viet Lam; Jae-Dong Lee; Renhe Jia
Year: 2015
Document Type:
Effects of surface zeta potential on the filtration behavior of colloidal abrasives
Publisher: American Vacuum Society (AVS)
Authors:YiWei Lu; Henry Wang; Dean Tsou; Bob Shie; Hj Yang; Isamu Funahashi
Year: 2015
Document Type:
Novel CMP slurry for polishing silicon containing materials
Publisher: American Vacuum Society (AVS)
Authors:Chun-Chieh Lee; Yun-Lung Ho; Song-Yuan Chang; Ming-Hui Lu; Ming-Che Ho
Year: 2015
Document Type:
Conditioner characterization and implementation for impacts of diamonds on CMP pad texture and performance
Publisher: American Vacuum Society (AVS)
Authors:Zhan Liu; John McCormick; Todd Buley
Year: 2015
Document Type:
Optimal shape of retainer ring considering edge exclusion and slurry film thickness
Publisher: American Vacuum Society (AVS)
Authors:Jinwoo Park; Cheolmin Shin; Taesung Kim; Hongyi Qin
Year: 2015
Document Type:
Removal mechanisms of glass and sapphire materials by slurry free lapping
Publisher: American Vacuum Society (AVS)
Authors:Deog-Ju Moon; Nagendra Prasad Yerriboina; Si-Hyeong Cho; Sung-Ho Park; Young-Gil Seo; Jin-Goo Park
Year: 2015
Document Type:
Study on innovative plasma fusion CMP and its application to processing of diamond substrate
Publisher: American Vacuum Society (AVS)
Authors:Hideaki Nishizawa; Koki Oyama; Toshiro K. Doi; Hideo Aida; Seongwoo Kim; Yasuhisa Sano; Syuhei Kurokawa; Chengwu Wan
Year: 2015
Document Type:
Optimization of machining conditions of basic-type CMP/P-CVM fusion processing using SiC substrate
Publisher: American Vacuum Society (AVS)
Authors:Yasuhisa Sano; Kousuke Shiozawa; Toshiro Doi; Syuhei Kurokawa; Hideo Aida; Koki Oyama; Tadakazu Miyashita; Haruo Sumizawa; Kazuto Yamauchi
Year: 2015
Document Type:
Slurry free lapping of silicon wafer for the application of thinning of wafer backside during TSV and packaging
Publisher: American Vacuum Society (AVS)
Authors:Deog-Ju Moon; Nagendra Prasad Yerriboina; Si-Hyeong Cho; Sung-Ho Park; Young-Gil Seo; Jin-Goo Park
Year: 2015
Document Type:
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