IEEE - Institute of Electrical and Electronics Engineers, Inc. - X-ray lithography system for submicron device fabrication

Author(s): Fay, B. ; Cornette, A. ; Nivoliers, J.P.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1982
Conference Location: San Francisco, CA, USA, USA
Conference Date: 13 December 1982
Page(s): 411 - 414
DOI: 10.1109/IEDM.1982.190311
Regular:

The fabrication of submicron devices with linewidths as small as 0.2 µm requires an advanced lithography system with the capability of fine line patterning as well as of very accurate pattern... View More

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