IEEE - Institute of Electrical and Electronics Engineers, Inc. - Electron beam lithography for 1 micron FET logic circuit fabrication

Author(s): Grobman, W.D. ; Luhn, H.E. ; Donohue, T.P. ; Speth, A.J. ; Wilson, A.D. ; Hatzakis, M. ; Chang, T.H.P.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1978
Conference Location: Washigton, DC, USA, USA
Conference Date: 4 December 1978
Page(s): 58 - 61
DOI: 10.1109/IEDM.1978.189351
Regular:

We describe the fabrication of 1 micron minimum linewidth FET polysilicon devices and circuits. These were designed for the tight dimensional groundrules achievable using direct wafer write... View More

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