IEEE - Institute of Electrical and Electronics Engineers, Inc. - Interface Films in the Si-Al System

8th Reliability Physics Symposium

Author(s): J. E. Lawrence ; M. S. Khidr
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 April 1970
Conference Location: Las Vegas, NV, USA, USA
Conference Date: 7 April 1970
Page(s): 285 - 287
ISSN (Paper): 0735-0791
DOI: 10.1109/IRPS.1970.362472
Regular:

Carbon-like interface films exert both a metallurigical and electrical effect on Semiconductor products. Test devices without contamination have uniform silicon to aluminum diffusion, Rc... View More

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