IEEE - Institute of Electrical and Electronics Engineers, Inc. - Dynamic simulation and optimization of Cu CVD unit process for environmentally benign manufacturing

Author(s): Soon Cho ; Wei Lei ; A. Melvin ; G.W. Rubloff
Sponsor(s): IEEE Electron Devices Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 August 2004
Volume: 17
Page(s): 455 - 469
ISSN (Paper): 0894-6507
ISSN (Online): 1558-2345
DOI: 10.1109/TSM.2004.831942
Regular:

Environmentally benign semiconductor manufacturing requires methodologies which enable cooptimization of multiple objectives, namely environmental metrics (e.g., precursor utilization efficiency,... View More

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