IEEE - Institute of Electrical and Electronics Engineers, Inc. - Neural network based uniformity profile control of linear chemical-mechanical planarization

Author(s): Jingang Yi ; Ye Sheng ; C.S. Xu
Sponsor(s): IEEE Electron Devices Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2003
Volume: 16
Page Count: 12
Page(s): 609 - 620
ISSN (Paper): 0894-6507
ISSN (Online): 1558-2345
DOI: 10.1109/TSM.2003.818987
Regular:

In this paper, a neural network based uniformity controller is developed for the linear chemical-mechanical planarization (CMP) process. The control law utilizes the metrology measurements of the... View More

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