IEEE - Institute of Electrical and Electronics Engineers, Inc. - Electroless nickel films: properties and fabricated cavity structure

Author(s): Seung Hwan Yi ; F.J. von Preissig ; Eun Sok Kim
Sponsor(s): IEEE Electron Devices Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 August 2002
Volume: 11
Page Count: 9
Page(s): 293 - 301
ISSN (Paper): 1057-7157
ISSN (Online): 1941-0158
DOI: 10.1109/JMEMS.2002.800614
Regular:

Properties of 6-/spl mu/m-thick films of electroless, phosphorus-containing nickel grown on evaporated Ni seed layers were measured as a function of bath conditions. The bath variables were... View More

Advertisement