IEEE - Institute of Electrical and Electronics Engineers, Inc. - Post-CMOS processing for high-aspect-ratio integrated silicon microstructures

Author(s): Huikai Xie ; L. Erdmann ; Xu Zhu ; K.J. Gabriel ; G.K. Fedder
Sponsor(s): IEEE Electron Devices Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 April 2002
Volume: 11
Page Count: 9
Page(s): 93 - 101
ISSN (Paper): 1057-7157
ISSN (Online): 1941-0158
DOI: 10.1109/84.993443
Regular:

Presents a new fabrication sequence for integrated-silicon microstructures designed and manufactured in a conventional complementary metal-oxide-semiconductor (CMOS) process. The sequence... View More

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