IEEE - Institute of Electrical and Electronics Engineers, Inc. - Silicon micromachining using in situ DC microplasmas

Author(s): C.G. Wilson ; Y.B. Gianchandani
Sponsor(s): IEEE Electron Devices Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 March 2001
Volume: 10
Page Count: 5
Page(s): 50 - 54
ISSN (Paper): 1057-7157
ISSN (Online): 1941-0158
DOI: 10.1109/84.911091
Regular:

This paper reports on the generation of spatially confined plasmas and their application to silicon etching. The etching is performed using SF/sub 6/ gas and dc power applied between thin-film... View More

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