IEEE - Institute of Electrical and Electronics Engineers, Inc. - Numerical and analytic techniques to study capacitive RF discharges

Author(s): N. Gupta ; G.R. Govinda Raju
Sponsor(s): Nat. Natural Sci. Found. China
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 October 2000
Volume: 7
Page Count: 16
Page(s): 705 - 720
ISSN (Paper): 1070-9878
DOI: 10.1109/94.879364
Regular:

Capacitively coupled RF plasma sources are used extensively in the microelectronics industry for commercial production as well as laboratory research and development. This paper deals with the... View More

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