IEEE - Institute of Electrical and Electronics Engineers, Inc. - Effect of support compliance and residual stress on the shape of doubly supported surface-micromachined beams

Author(s): M.J. Kobrinsky ; E.R. Deutsch ; S.D. Senturia
Sponsor(s): IEEE Electron Devices Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 September 2000
Volume: 9
Page Count: 9
Page(s): 361 - 369
ISSN (Paper): 1057-7157
ISSN (Online): 1941-0158
DOI: 10.1109/84.870062
Regular:

Doubly supported silicon-micromachined beams are increasingly used to study the mechanical properties of materials. Residual stresses in the beams and support compliance cause significant... View More

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