IEC - International Electrotechnical Commission - IEC 62047-18:2013

Semiconductor devices - Micro-electromechanical devices - Part 18: Bend testing methods of thin film materials

published
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Organization: IEC - International Electrotechnical Commission
Publication Date: 17 July 2013
Status: published
Page Count: 26
ICS Code (Other semiconductor devices): 31.080.99
abstract:

IEC 62047-18:2013 specifies the method for bend testing of thin film materials with a length and width under 1 mm and a thickness in the range between 0,1 micrometre and 10 micrometre. This... View More

Document History

IEC 62047-18:2013
July 17, 2013
Semiconductor devices - Micro-electromechanical devices - Part 18: Bend testing methods of thin film materials
IEC 62047-18:2013 specifies the method for bend testing of thin film materials with a length and width under 1 mm and a thickness in the range between 0,1 micrometre and 10 micrometre. This...
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