IEC - International Electrotechnical Commission - IEC 62374-1:2010
Semiconductor devices - Part 1: Time-dependent dielectric breakdown (TDDB) test for inter-metal layers
published
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| Organization: | IEC - International Electrotechnical Commission |
| Publication Date: | 29 September 2010 |
| Status: | published |
| Page Count: | 32 |
| ICS Code (Other semiconductor devices): | 31.080.99 |
abstract:
IEC 62374-1:2010 describes a test method, test structure and lifetime estimation method of the time-dependent dielectric breakdown (TDDB) test for inter-metal layers applied in semiconductor... View More
Document History
IEC 62374-1:2010
September 29, 2010
Semiconductor devices - Part 1: Time-dependent dielectric breakdown (TDDB) test for inter-metal layers
IEC 62374-1:2010 describes a test method, test structure and lifetime estimation method of the time-dependent dielectric breakdown (TDDB) test for inter-metal layers applied in semiconductor devices.