IEEE - Institute of Electrical and Electronics Engineers, Inc. - Simultaneous simulation of systematic and stochastic process variations

2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

Author(s): J. Lorenz ; E. Bar ; A. Burenkov ; P. Evanschitzky ; A. Asenov ; L. Wang ; X. Wang ; A. R. Brown ; C. Millar ; D. Reid
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 September 2014
Conference Location: Yokohama, Japan
Conference Date: 9 September 2014
Page(s): 289 - 292
ISBN (CD): 978-1-4799-5285-4
ISBN (Electronic): 978-1-4799-5288-5
ISBN (DVD): 978-1-4799-5286-1
ISBN (Paper): 978-1-4799-5287-8
ISSN (Paper): 1946-1569
DOI: 10.1109/SISPAD.2014.6931620
Regular:

An efficient approach is presented and demonstrated which enables the simultaneous simulation of the impact of several sources of process variations, ranging from equipment-induced to stochastic... View More

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