IEEE - Institute of Electrical and Electronics Engineers, Inc. - Simulations of microchannel plate sensitivity to <20 keV x-rays as a function of energy and incident angle

2013 IEEE 40th International Conference on Plasma Sciences (ICOPS)

Author(s): Craig A. Kruschwitz ; Ming Wu ; Greg Rochau
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 June 2013
Conference Location: San Francisco, CA, USA
Conference Date: 16 June 2013
Page(s): 1
ISBN (Electronic): 978-1-4673-5171-3
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2013.6635022
Regular:

We present results of Monte Carlo simulations of microchannel plate (MCP) response to x-rays in the 250 eV to 20 keV energy range as a function of both x-ray energy and impact angle. The model is... View More

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