IEEE - Institute of Electrical and Electronics Engineers, Inc. - Parametric studyoflow frequency rotating structures in high power impulse magnetron sputtering (HIPIMS) discharges

2013 IEEE 40th International Conference on Plasma Sciences (ICOPS)

Author(s): Sara Gallian ; Thomas Mussenbrock ; Ralf-Peter Brinkmann ; William N. G. Hitchon
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 June 2013
Conference Location: San Francisco, CA, USA
Conference Date: 16 June 2013
Page(s): 1
ISBN (Electronic): 978-1-4673-5171-3
ISSN (Paper): 0730-9244
DOI: 10.1109/PLASMA.2013.6634889
Regular:

Summary form only given. HiPIMS discharges are able to produce a high density plasma (peak electron density 1018 - 1020 m-3) by applying large voltages to a... View More

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