IEEE - Institute of Electrical and Electronics Engineers, Inc. - Sharp vertices in asymmetric Y-junctions by double masking

Author(s): J.J.G.M. van der Tol ; J.W. Pedersen ; E.G. Metaal ; Y.S. Oei ; F.H. Green ; P. Demeester
Sponsor(s): IEEE Lasers and Electro-Optics Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 February 1994
Volume: 6
Page(s): 249 - 251
ISSN (Electronic): 1941-0174
ISSN (Paper): 1041-1135
DOI: 10.1109/68.275440
Regular:

A novel fabrication procedure is presented for the realization of sharp vertices in Y-junctions on InGaAsP/InP. Overlapping masking layers of silica and resist respectively define the two branches... View More

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