IEEE - Institute of Electrical and Electronics Engineers, Inc. - Improved on-axis DC magnetron sputtering for large-area deposition of YBa/sub 2/Cu/sub 3/O/sub 7/-films

Author(s): U. Kruger ; R. Kutzner ; R. Wordenweber
Sponsor(s): Council on Superconductivity
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 March 1993
Volume: 3
Page Count: 4
Page(s): 1,687 - 1,690
ISSN (Electronic): 1558-2515
ISSN (Paper): 1051-8223
DOI: 10.1109/77.233917
Regular:

A method of stabilizing the plasma during high-pressure DC sputter-deposition of YBa/sub 2/Cu/sub 3/O/sub 7/ is introduced. The plasma is monitored by optical emission spectroscopy and Langmuir... View More

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