IEEE - Institute of Electrical and Electronics Engineers, Inc. - Effect of system interactions on the removal of total oxidizable carbon from DI water polishing loops

Author(s): R.A. Governal ; A. Bonner ; F. Shadman
Sponsor(s): IEEE Electron Devices Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 February 1992
Volume: 5
Page Count: 4
Page(s): 70 - 73
ISSN (Paper): 0894-6507
ISSN (Online): 1558-2345
DOI: 10.1109/66.121983
Regular:

Ultra-pure water systems in semiconductor plants consist of many components. Although the operating principles behind each component are well-known, the interactions between system components,... View More

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