IEEE - Institute of Electrical and Electronics Engineers, Inc. - Research on the mask micro-transparent defect repair assisted with UV laser

2011 IEEE International Conference on Mechatronics and Automation (ICMA)

Author(s): Min Wang ; Jimin Chen
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 August 2011
Conference Location: Beijing, China, China
Conference Date: 7 August 2011
Page(s): 1,237 - 1,241
ISBN (CD): 978-1-4244-8114-9
ISBN (Electronic): 978-1-4244-8115-6
ISBN (Paper): 978-1-4244-8113-2
ISSN (CD): 2152-7431
ISSN (Paper): 2152-7431
DOI: 10.1109/ICMA.2011.5985838
Regular:

Photo-mask is a pivotal tool in photolithography process. The quality of the photo-mask has much effect on the figures of integrate circuit. With the fast development of the micro-electronics... View More

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