IEEE - Institute of Electrical and Electronics Engineers, Inc. - Advanced FinFET process technology for 20 nm node and beyond

2011 IEEE 4th International Nanoelectronics Conference (INEC)

Author(s): Masahara, M. ; Matsukawa, T. ; Endo, K. ; Liu, Y.-X. ; Mizubayashi, W. ; Migita, S. ; O'uchi, S. ; Ota, H. ; Morita, Y.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 June 2011
Conference Location: Tao-Yuan, Taiwan, Taiwan
Conference Date: 21 June 2011
Page(s): 1 - 2
ISBN (Electronic): 978-1-4577-0378-2
ISBN (Paper): 978-1-4577-0379-9
ISBN (Online): 978-1-4577-0377-5
ISSN (Electronic): 2159-3531
ISSN (Paper): 2159-3523
ISSN (Online): 2159-3523
DOI: 10.1109/INEC.2011.5991771
Regular:

One of the biggest challenges for the VLSI circuits with 20-nm-technology nodes and beyond is to overcome the issue of a catastrophic increase in power dissipation of the circuit due to short... View More

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