IEEE - Institute of Electrical and Electronics Engineers, Inc. - Direct metal nano-patterning on irregular substrate surfaces by reversal imprint lithography

2011 IEEE 4th International Nanoelectronics Conference (INEC)

Author(s): Bing-Rui Lu ; Xin-Ping Qu ; Ran Liu ; Yifang Chen ; Yuanyuan Wang
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 June 2011
Conference Location: Tao-Yuan, Taiwan
Conference Date: 21 June 2011
Page(s): 1 - 2
ISBN (Electronic): 978-1-4577-0378-2
ISBN (Paper): 978-1-4577-0379-9
ISBN (Online): 978-1-4577-0377-5
ISSN (Electronic): 2159-3531
ISSN (Paper): 2159-3523
ISSN (Online): 2159-3523
DOI: 10.1109/INEC.2011.5991759
Regular:

We demonstrate a new direct metal patterning method to form nanoscale patterns on irregularly shaped substrates through a reversal imprint process, called Reversal Imprint Metal Transfer (RIMT).... View More

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