IEEE - Institute of Electrical and Electronics Engineers, Inc. - Aggressively scaled high-k last metal gate stack with low variability for 20nm logic high performance and low power applications

2011 IEEE Symposium on VLSI Technology

Author(s): Hyun, S. ; Han, J. ; Park, H. ; Na, H. ; Son, H.J. ; Lee, H.Y. ; Hong, H. ; Lee, H. ; Song, J. ; Kim, J.J. ; Lee, J. ; Jeong, W.C. ; Cho, H.J. ; Seo, K.I. ; Kim, D.W. ; Sim, S.P. ; Kang, S.B. ; Sohn, D.K. ; Siyoung Choi ; Kang, H. ; Chilhee Chung
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 June 2011
Conference Location: Kyoto, Japan, Japan
Conference Date: 14 June 2011
Page(s): 32 - 33
ISBN (CD): 978-4-86348-166-4
ISBN (Paper): 978-1-4244-9949-6
ISSN (CD): 0743-1562
ISSN (Electronic): 2158-9682
ISSN (Paper): 0743-1562
Regular:

An aggressively scaled high-k last metal gate (HKMG) stack was successfully implemented for 20nm high performance and low power applications and even below. Key technologies include aggressive... View More

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