IEEE - Institute of Electrical and Electronics Engineers, Inc. - Efficient light scattering modeling for alignment, metrology, and resist exposure in photolithography

Author(s): C.-M. Yuan
Sponsor(s): IEEE Electron Devices Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 July 1992
Volume: 39
Page Count: 11
Page(s): 1,588 - 1,598
ISSN (Paper): 0018-9383
ISSN (Online): 1557-9646
DOI: 10.1109/16.141223
Regular:

In previous work, a two-dimensional waveguide model has been developed and examined extensively so that rigorous light scattering calculations for photolithography-related processes, such... View More

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