IEEE - Institute of Electrical and Electronics Engineers, Inc. - Process Parameters of Mold Fabrication for Nano-Imprint Lithography

2010 International Conference on Electrical and Control Engineering (ICECE)

Author(s): Yan Le ; Li Hansong ; Liu Hongzhong
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 June 2010
Conference Location: Wuhan, China, China
Conference Date: 25 June 2010
Page(s): 5,421 - 5,424
ISBN (CD): 978-0-7695-4031-3
ISBN (Electronic): 978-1-4244-6881-2
ISBN (Paper): 978-1-4244-6880-5
DOI: 10.1109/iCECE.2010.1316
Regular:

In nano-imprint lithography, PDMS is chosen to be soft mold material, which has features of excellent demolding character and large transferring area of imprinting pattern. Besides, the soft mold... View More

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