IEEE - Institute of Electrical and Electronics Engineers, Inc. - Optimization of trench manufacturing for a new high-voltage semiconductor technology

2010 IEEE International Symposium on Industrial Electronics (ISIE 2010)

Author(s): Fritzsch, M. ; Schramm, M. ; Erler, K. ; Heinz, S. ; Horstmann, J.T. ; Eckoldt, U. ; Kittler, G. ; Lerner, R. ; Schottmann, K.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 July 2010
Conference Location: Bari, Italy, Italy
Conference Date: 4 July 2010
Page(s): 974 - 978
ISBN (CD): 978-1-4244-6391-6
ISBN (Electronic): 978-1-4244-6392-3
ISBN (Paper): 978-1-4244-6390-9
DOI: 10.1109/ISIE.2010.5637007
Regular:

Deep trenches for device insulation in a high-voltage process in thick SOI were fabricated using different manufacturing technologies. The trenches have been investigated by... View More

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