IEEE - Institute of Electrical and Electronics Engineers, Inc. - Saturated laser of Ne-like argon and Xe-based extreme ultraviolet source radiated from capillary discharge plasma

2010 10th Russian-Chinese Symposium on Laser Physics and Laser Technologies (RCSLPLT) & 2010 Academic Symposium on Optoelectronics Technology (ASOT)

Author(s): Yongpeng Zhao ; Qi Wang ; Yao Xie ; Xu Qiang ; Shan Jiang ; Qi Li
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 July 2010
Conference Location: Harbin, China, China
Conference Date: 28 July 2010
Page(s): 16 - 19
ISBN (CD): 978-1-4244-5512-6
ISBN (Electronic): 978-1-4244-5513-3
ISBN (Paper): 978-1-4244-5511-9
DOI: 10.1109/RCSLPLT.2010.5615423
Regular:

In this paper, we report the saturated soft x-ray laser at 46.9nm in Ne-like Ar ions and extreme ultraviolet source at 13.5nm in Xe10+ ions emitted from capillary discharge plasma. The... View More

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