IEEE - Institute of Electrical and Electronics Engineers, Inc. - Research of the collection efficiency of collectors for EUV source

2010 10th Russian-Chinese Symposium on Laser Physics and Laser Technologies (RCSLPLT) & 2010 Academic Symposium on Optoelectronics Technology (ASOT)

Author(s): Li Qiu-ming ; Zhang Shu-qing ; Zhu Dong-yuan ; Wang Qi ; Zhao Yong-peng
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 July 2010
Conference Location: Harbin, China, China
Conference Date: 28 July 2010
Page(s): 209 - 212
ISBN (CD): 978-1-4244-5512-6
ISBN (Electronic): 978-1-4244-5513-3
ISBN (Paper): 978-1-4244-5511-9
DOI: 10.1109/RCSLPLT.2010.5615263
Regular:

The collector for EUV source is one of the most important parts in EUV lithography system, which determines whether the whole EUV lithography can be used or not. Collection efficiency is the most... View More

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