IEEE - Institute of Electrical and Electronics Engineers, Inc. - Improvement the light extraction efficiencies with patterned sapphire substrates by wet and ICP etching method

2010 15th OptoeElectronics and Communications Conference (OECC)

Author(s): Chan-Shou Wu ; Tsair-Chun Liang ; Wei-Chih Cheng ; Shun-yuan Huang ; Hon Kuan
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 July 2010
Conference Location: Sapporo, Japan, Japan
Conference Date: 5 July 2010
Page(s): 676 - 677
ISBN (CD): 978-4-88552-246-8
ISBN (Electronic): 978-4-88552-246-8
ISBN (Paper): 978-1-4244-6785-3
Regular:

In this study, sapphire substrates patterned by a selective chemical wet and an inductively coupled plasma (ICP) etching technique was proposed to improve the performance of GaN-based... View More

Advertisement