IEEE - Institute of Electrical and Electronics Engineers, Inc. - P1–6: Compensation of divergence of space charge dominated ion beams using electron injection and confinement in non-uniform magnetic fields

2010 23rd International Vacuum Nanoelectronics Conference (IVNC)

Author(s): Nicolaescu, D. ; Sakai, S. ; Gotoh, Y. ; Ishikawa, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 July 2010
Conference Location: Palo Alto, CA, USA, USA
Conference Date: 26 July 2010
Page(s): 40 - 41
ISBN (Electronic): 978-1-4244-7888-0
ISBN (Paper): 978-1-4244-7889-7
DOI: 10.1109/IVNC.2010.5563163
Regular:

Advanced ion implantation systems require transportation to wafer of space charge dominated ion beams. Compensation of ion beam divergence may be obtained through electron injection and... View More

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