IEEE - Institute of Electrical and Electronics Engineers, Inc. - Dual beam laser spike annealing technology

2010 International Workshop on Junction Technology (IWJT)

Author(s): Yun Wang ; Shaoyin Chen ; Shen, M. ; Xiaoru Wang ; Senquan Zhou ; Hebb, J. ; Owen, D.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2010
Conference Location: Shanghai, China, China
Conference Date: 10 May 2010
Page(s): 1 - 6
ISBN (CD): 978-1-4244-5868-4
ISBN (Electronic): 978-1-4244-5869-1
ISBN (Paper): 978-1-4244-5866-0
DOI: 10.1109/IWJT.2010.5474998
Regular:

A new dual-beam laser spike annealing (DB-LSA) technology is developed to expand the application space of non-melt laser annealing. In the standard LSA configuration, a single narrow laser beam is... View More

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