IEEE - Institute of Electrical and Electronics Engineers, Inc. - Dedication load based dispatching rule for photolithograph machines with dedication constraint

2016 Winter Simulation Conference (WSC)

Author(s): Yong H. Chung ; Kang H. Cho ; Sang C. Park ; Byung H. Kim
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 December 2016
Conference Location: Washington, DC, USA
Conference Date: 11 December 2016
Page(s): 2,731 - 2,739
ISBN (CD): 978-1-5090-4484-9
ISBN (Electronic): 978-1-5090-4486-3
ISBN (USB): 978-1-5090-4485-6
ISSN (Electronic): 1558-4305
DOI: 10.1109/WSC.2016.7822310
Regular:

This paper addresses a semiconductor wafer fabrication (FAB) scheduling problem with dedication constraint. Under dedication constraint, a fabrication lot must be processed using the same photo... View More

Advertisement