IEEE - Institute of Electrical and Electronics Engineers, Inc. - A Mask-Misalignment Offset Reduction Method for Design of Cross-Like CMOS Hall Devices

2016 Sixth International Conference on Instrumentation & Measurement, Computer, Communication and Control (IMCCC)

Author(s): Fei Lyu ; Zhenyan Zhang ; Yifan Pan ; Zidi Qing ; Shuzhuan He ; Li Li ; Hongbing Pan ; Eng-Huat Toh ; Xinfu Liu ; Yinjie Ding
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 July 2016
Conference Location: Harbin, China
Conference Date: 21 July 2016
Page(s): 150 - 154
ISBN (CD): 978-1-5090-1194-0
ISBN (Electronic): 978-1-5090-1195-7
DOI: 10.1109/IMCCC.2016.65
Regular:

The mask-misalignment offset, as an inevitable part of the initial offset, is necessary to be reduced in the design of cross-like Hall devices. In this paper, a method is proposed to reduce the... View More

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