IEEE - Institute of Electrical and Electronics Engineers, Inc. - Parameter-oriented reduction strategies for a thermo-mechanical model of extreme ultraviolet reticles

2016 IEEE Conference on Control Applications (CCA)

Author(s): Can Bikcora ; Siep Weiland
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 September 2016
Conference Location: Buenos Aires, Argentina
Conference Date: 19 September 2016
Page(s): 1,149 - 1,154
ISBN (Electronic): 978-1-5090-0755-4
DOI: 10.1109/CCA.2016.7587961
Regular:

With the demands for shrinkage in feature sizes becoming more than ever, the extreme ultraviolet (EUV) lithography is the route pursued by the industry's leading authorities. Leaving the strive... View More

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