IEEE - Institute of Electrical and Electronics Engineers, Inc. - Developing terahertz filters using the deep reactive ion etching (DRIE) process

2016 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)

Author(s): Zhang-Cheng Hao ; Wei Hong
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 July 2016
Conference Location: Chengdu, China
Conference Date: 20 July 2016
Page(s): 1 - 3
ISBN (Electronic): 978-1-5090-2017-1
ISBN (USB): 978-1-5090-2016-4
DOI: 10.1109/IMWS-AMP.2016.7588426
Regular:

This paper introduces some recent developments of terahertz bandpass filters. By adopting dual-resonating-mode cavities, transmission zeroes are obtained in the design, which greatly... View More

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