IEEE - Institute of Electrical and Electronics Engineers, Inc. - Very sensitive real-time inline process mass spectrometer based on FFT Ion Trap technique

2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

Author(s): Hin Yiu Chung ; Michel Aliman ; Gennady Fedosenko ; Alexander Laue ; Rudiger Reuter ; Valerie Derpmann ; Leonid Gorkhover ; Martin Antoni
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2016
Conference Location: Saratoga Springs, NY, USA
Conference Date: 16 May 2016
Page(s): 263 - 266
ISBN (Electronic): 978-1-5090-0270-2
ISSN (Electronic): 2376-6697
DOI: 10.1109/ASMC.2016.7491140
Regular:

In this work, we introduce a new, very fast and extremely sensitive inline process mass spectrometry technique based on Fourier-Transform 3D-Quadrupole Ion Trap technology. With this new... View More

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