IEEE - Institute of Electrical and Electronics Engineers, Inc. - Multiple in/Multiple out, run to run controller for accurate and stable epitaxy processes: APC: Advanced process control

2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

Author(s): Rintsch Benjamin ; Lippl Gerhard ; Lipp Stefan
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2016
Conference Location: Saratoga Springs, NY, USA
Conference Date: 16 May 2016
Page(s): 180 - 184
ISBN (Electronic): 978-1-5090-0270-2
ISSN (Electronic): 2376-6697
DOI: 10.1109/ASMC.2016.7491121
Regular:

The development and usage of a Multiple in / Multiple out Run to Run Controller for complex epitaxy systems is the topic of this manuscript. The system uses dynamic status values and can be... View More

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