IEEE - Institute of Electrical and Electronics Engineers, Inc. - Trench depth measurement system for VLSI DRAM's capacitor cells using optical fiber and michelson interferometer

Author(s): K. Takada ; K. Chida ; J. Noda ; S. Nakajima
Sponsor(s): IEEE Lasers and Electro-Optics Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 July 1987
Volume: 5
Page(s): 881 - 887
ISSN (Paper): 0733-8724
ISSN (Online): 1558-2213
DOI: 10.1109/JLT.1987.1075606
Regular:

A simple method to precisely measure the trench depth of VLSI DRAM's capacitor cells is presented. The measurement system uses a Michelson interferometer and a white light source. The trench depth... View More

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