IEEE - Institute of Electrical and Electronics Engineers, Inc. - Deep reactive ion etching to realize silicon nano and micro needles and nanostructures

2009 International Semiconductor Device Research Symposium (ISDRS)

Author(s): Sanaee, Z. ; Mehran, M. ; Mohajerzadeh, S. ; Araghchini, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 December 2009
Conference Location: College Park, MD, USA, USA
Conference Date: 9 December 2009
Page(s): 1 - 2
ISBN (CD): 978-1-4244-6031-1
ISBN (Paper): 978-1-4244-6030-4
DOI: 10.1109/ISDRS.2009.5378338
Regular:

Hollow needles are important structures for smart drug delivery and biotechnology applications. In this paper we report a novel hydrogen-assisted deep reactive ion etching technique to realize... View More

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