IEEE - Institute of Electrical and Electronics Engineers, Inc. - Crystalline Orientation and Perpendicular Magnetic Anisotropy of Iron Oxide Thin Films Deposited by Target Facing Type Sputtering

Author(s): Y. Hoshi ; M. Naoe
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 1987
Volume: 2
Page(s): 431 - 433
ISSN (Paper): 0882-4959
DOI: 10.1109/TJMJ.1987.4549477
Regular:

Opposed-target sputtering is employed to produce Fe3O4 single-phase films with (111) orientation on glass substrates and ZnO-coated silicon wafers. The magnetostriction values of these films were... View More

Advertisement