IEEE - Institute of Electrical and Electronics Engineers, Inc. - U-Type Target for High Rate Sputtering Method

Author(s): T. Ide ; Y. Shimada
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 March 1987
Volume: 2
Page(s): 261 - 263
ISSN (Paper): 0882-4959
DOI: 10.1109/TJMJ.1987.4549398
Regular:

A new type of sputtering target, which produces magnetic fields strong enough for magnetron sputtering of ferromagnetic targets, and a high concentration of particle beams was developed. The... View More

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