IEEE - Institute of Electrical and Electronics Engineers, Inc. - ARL criterion in Bayesian process control using hidden Markov model

2009 IEEE International Conference on Industrial Engineering and Engineering Management (IEEM)

Author(s): Rui Jiang ; Makis, V.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 December 2009
Conference Location: Hong Kong, China, China
Conference Date: 8 December 2009
Page(s): 228 - 232
ISBN (CD): 978-1-4244-4870-8
ISBN (Paper): 978-1-4244-4869-2
DOI: 10.1109/IEEM.2009.5373379
Regular:

In this paper, a multivariate Bayesian control chart is designed for a condition-based maintenance application. The system deterioration process is modeled as a 3-state hidden Markov process, with... View More

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