IEEE - Institute of Electrical and Electronics Engineers, Inc. - Expanded application space for laser spike annealing of CMOS devices

2009 17th International Conference on Advanced Thermal Processing of Semiconductors (RTP)

Author(s): Hebb, J. ; Yun Wang ; Shaoyin Chen ; Shen, M. ; Senquan Zhou ; Xiaoru Wang ; Owen, D.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 September 2009
Conference Location: Albany, NY, USA, USA
Conference Date: 29 September 2009
Page(s): 1 - 7
ISBN (CD): 978-1-4244-3815-0
ISBN (Paper): 978-1-4244-3814-3
ISSN (Paper): 1944-0251
DOI: 10.1109/RTP.2009.5373481
Regular:

LSA was first introduced into mainstream semiconductor manufacturing for logic IC's at the 65nm node, continuing the natural evolution of semiconductor thermal processing to higher temperatures... View More

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