IEEE - Institute of Electrical and Electronics Engineers, Inc. - Statistical Analysis of Metal Gate Workfunction Variability, Process Variation, and Random Dopant Fluctuation in Nano-CMOS Circuits

2009 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

Author(s): Chih-Hong Hwang ; Tien-Yeh Li ; Ming-Hung Han ; Kuo-Fu Lee ; Hui-Wen Cheng ; Yiming Li
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 September 2009
Conference Location: San Diego, CA, USA, USA
Conference Date: 9 September 2009
Page(s): 1 - 4
ISBN (CD): 978-1-4244-3949-2
ISBN (Paper): 978-1-4244-3974-8
ISSN (Paper): 1946-1569
DOI: 10.1109/SISPAD.2009.5290239
Advertisement