IEEE - Institute of Electrical and Electronics Engineers, Inc. - Compact and Efficient Monte Carlo Method to Reproduce Size Effect on Resistivity in Sub-0.1μm Metallic Interconnects

2009 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

Author(s): Kurusu, T. ; Wada, M. ; Matsunaga, N. ; Tanimoto, H. ; Aoki, N. ; Toyoshima, Y. ; Shibata, H.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 September 2009
Conference Location: San Diego, CA, USA, USA
Conference Date: 9 September 2009
Page(s): 1 - 4
ISBN (CD): 978-1-4244-3949-2
ISBN (Paper): 978-1-4244-3974-8
ISSN (Paper): 1946-1569
DOI: 10.1109/SISPAD.2009.5290224
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