IEEE - Institute of Electrical and Electronics Engineers, Inc. - Finite integration (FI) method for modelling optical waves in lithography masks

2009 International Conference on Electromagnetics in Advanced Applications (ICEAA)

Author(s): Rahimi, Z. ; Erdmann, A. ; Pflaum, C.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 September 2009
Conference Location: Torino, Italy, Italy
Conference Date: 14 September 2009
Page(s): 809 - 812
ISBN (CD): 978-1-4244-3386-5
ISBN (Paper): 978-1-4244-3385-8
DOI: 10.1109/ICEAA.2009.5297317
Regular:

Light diffraction from lithography masks depends on the geometrical shape of the mask pattern which is created by an etch process. The analysis of relevant effects requires the application of an... View More

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