IEEE - Institute of Electrical and Electronics Engineers, Inc. - Soft UV-nanoimprint lithography for the fabrication of frequency selective components

2009 Conference on Lasers & Electro-Optics Europe & 11th European Quantum Electronics Conference (CLEO/EQEC)

Author(s): Viheriala, J. ; Tommila, J. ; Laakso, A. ; Ranta, S. ; Vartiainen, I. ; Tuovinen, H. ; Telkkala, J. ; Vallius, T. ; Niemi, T. ; Dumitrescu, M. ; Pessa, M.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 June 2009
Conference Location: Munich, Germany, Germany
Conference Date: 14 June 2009
Page(s): 1
ISBN (CD): 978-1-4244-4080-1
ISBN (Paper): 978-1-4244-4079-5
DOI: 10.1109/CLEOE-EQEC.2009.5196481
Regular:

Since the first introduction of nanoimprint lithography (NIL) in 1995 [1] there has been worldwide interest for various applications. NIL is a powerful nanopatterning method for two principal... View More

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