IEEE - Institute of Electrical and Electronics Engineers, Inc. - Machine learning based lithographic hotspot detection with critical-feature extraction and classification

2009 IEEE International Conference on IC Design and Technology (ICICDT)

Author(s): Duo Ding ; Xiang Wu ; Ghosh, J. ; Pan, D.Z.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2009
Conference Location: Austin, TX, USA, USA
Conference Date: 18 May 2009
Page(s): 219 - 222
ISBN (Paper): 978-1-4244-2933-2
ISBN (Online): 978-1-4244-2934-9
DOI: 10.1109/ICICDT.2009.5166300
Regular:

In this paper, we present a fast and accurate lithographic hotspot detection flow with a novel MLK (Machine Learning Kernel), based on critical feature extraction and classification. In our flow,... View More

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