IEEE - Institute of Electrical and Electronics Engineers, Inc. - Refinement and reuse of TLM 2.0 models: The key for ESL success

2009 International Symposium on VLSI Design, Automation and Test (VLSI-DAT)

Author(s): Reyes, V.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 April 2009
Conference Location: Hsinchu, Taiwan, Taiwan
Conference Date: 28 April 2009
Page(s): 102 - 105
ISBN (CD): 978-1-4244-2782-6
ISBN (Paper): 978-1-4244-2781-9
DOI: 10.1109/VDAT.2009.5158105
Regular:

ESL design methods and tools are being proposed to improve the productivity of the designers and to bridge the design and verification gaps. The main area where ESL solutions are being... View More

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