IEEE - Institute of Electrical and Electronics Engineers, Inc. - Etch adjustment for independent CD control in Double Patterning

2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2009)

Author(s): S. Barnola ; C. Lapeyre ; I. Servin ; M. McCallum ; H. Magoon
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2009
Conference Location: Berlin, Germany
Conference Date: 10 May 2009
Page(s): 66 - 69
ISBN (CD): 978-1-4244-3615-6
ISBN (Paper): 978-1-4244-3614-9
ISSN (Electronic): 2376-6697
ISSN (Paper): 1078-8743
DOI: 10.1109/ASMC.2009.5155955
Regular:

Double patterning (DP) has now become a fixture on the development roadmaps of many device manufacturers for half pitches of 32 nm and beyond. The line DP is a good candidate for logic... View More

Advertisement